Market Research > Industries > Polymers/Materials

Market Research: The Global Outlook for Resist, Etch,
and Cleaning Materials for Sub-0.25-Micron
Semiconductors 2001-2006

The Global Outlook for Resist, Etch, and Cleaning Materials for Sub-0.25-Micron Semiconductors 2001-2006 - Archived Report


Published May 2002

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This analysis is designed to help strategic planners of materials supply and process tool development to better understand the timing and impact of the inevitable changes for semiconductor fabrication practices.

Industry drivers explored in the study include: 1) product requirements for improved and faster-performing chemistries, materials, and systems; 2) stronger demand for scale of integration with increasing aspect ratios, which in turn increases the performance demand on all consumables for lithographic applications; and (3) complexities of ensuring compatibility with copper and low-k layers as well as the related development of resist, etch, and cleaning technologies. (Y499)

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– Select the sections in which you are interested by clicking on the appropriate boxes:

FULL REPORT [US$ 9 500 (nine thousand five hundred US Dollars)]

INTRODUCTION [US$ 0]

TECHNOLOGY OVERVIEW [US$ 1 425]

APPLICATIONS [US$ 1 425]

PHOTORESIST [US$ 1 425]

ETCHING COMPOUNDS [US$ 1 425]

CLEANING COMPOUNDS [US$ 1 425]

SUPPLIERS [US$ 2 375]

    AIR PRODUCTS AND CHEMICALS [US$ 250]

    TOKYO OHKA KOGYO [US$ 250]

    ASHLAND SPECIALTY CHEMICAL COMPANY [US$ 250]

    SHIPLEY COMPANY [US$ 250]

    JSR CORPORATION [US$ 250]

    KANTO KAGAKU [US$ 250]

    SUMITOMO CHEMICAL COMPANY, LTD. [US$ 250]

    ARCH CHEMICALS [US$ 250]

    CLARIANT/AZ MICROELECTRONIC MATERIALS [US$ 250]

    OTHER SUPPLIERS [US$ 350]

OPPORTUNITIES [US$ 950]

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