The Global Outlook for Resist, Etch, and Cleaning Materials for Sub-0.25-Micron Semiconductors 2001-2006
Published May 2002
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This
analysis is designed to help strategic planners of materials
supply and process tool development to better understand the
timing and impact of the inevitable changes for semiconductor
fabrication practices.
Industry
drivers explored in the study include: 1) product requirements
for improved and faster-performing chemistries, materials, and
systems; 2) stronger demand for scale of integration with increasing
aspect ratios, which in turn increases the performance demand
on all consumables for lithographic applications; and (3) complexities
of ensuring compatibility with copper and low-k layers as well
as the related development of resist, etch, and cleaning technologies. (Y499)
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