The Global Outlook for Chemical Mechanical Planarization Technology and Materials 2000-2005
Published August 2001
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This
is Kline's second edition of its examination of the
rapid growing use of abrasive slurries and other
consumables for CMP processes. The report focuses
on current developments and the outlook for major
CMP consumables such as abrasive slurries, pads,
brushes, and filter media by type of media planarized.
It includes quantitative information on the market
position and plans of existing suppliers and new
entrants to the market, as well as a detailed analysis
of the impact of the evolving electronic device industry
on CMP. (Y398A)
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